ISO 9001:2008 certified   For more information | Call (262) 293-0251

Octachlorotrisilane - Technical Grade

OCTS (TG) 

  • Product Number: 2790-TG
  • CAS Number: 13596-23-1

OCTACHLOROTRISILANE - Technical Grade

Properties

Boiling Point: 213 - 215 °C (lit.)
Melting Point: -67 °C
Density: 1.61 g/mL at 25 °C
Refractive index: n20/D 1.513
Appearance: colorless liquid
Vapor pressure: 90°: 10 mm ΔHvap: 51 kJ/mole

Applications: Silicon deposition, Silicon nanowires, trisilane oligosilanes

Purity by GC: 95.0% minimum

Silicon nitride and Silicon dioxide are some of the most widely used dielectric materials in Si microelectronics processing and can be deposited by CVD and ALD methods. Recent advances in ALD processes are being used to lower the thermal budget for the deposition of Silicon dioxide and Silicon nitride. There is considerable interest in low-temperature high-quality silicon nitride thin films for gate spacers of dynamic random access memory (DRAM) devices and other barrier layers. Octachlorotrisilane is being recognized as a promising precursor for such ALD processes to be used in high volume manufacturing. Octachlorotrisilane is a corrosive, water-reactive, colorless liquid that requires extreme care when handling and transporting.

Packaging

For other customer specific application octachlorotrisilane can be supplied in properly documented customer-supplied canisters or bubblers. Nova-Kem will also provide custom bubbler or canister configurations upon request.

Downloads

 

 


Go Back to Precursor Chemicals >>

Rapid Precursor Development™