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ALD 2012 & BALD 2012 - Atom Layer Deposition Conference

12th International Conference on Atomic Layer Deposition

Visit us at Booth 10!

The AVS Topical Conference on Atomic Layer Deposition (ALD 2012) will be a three-day meeting (preceded by one day of tutorials) dedicated to the science and technology of atomic layer controlled deposition of thin films. 

Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime. 

ALD is receiving attention for its potential applications from advanced electronics, microsystems and displays to energy capture and storage, solid state lighting, biotechnology, security and consumer products - particularly for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale.

Visit the ALD website for more information:  


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